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Spatial Atomic Layer Deposition for Large-Area Electronics
16 juni 2020 van 9:00 am tot 5:00 pm
Webinar: Spatial Atomic Layer Deposition for Large-Area Electronics
Thin-film transistors, encapsulation and area selective deposition
Please join us on Tuesday, June 16th
9am Eindhoven – 3pm Shanghai – 4pm Seoul – 4pm Tokyo
5pm Eindhoven – 11am New York – 8am San Francisco
About this webinar
This third webinar focuses on the application of Spatial ALD in large-area electronics. We will show how Spatial ALD can be used to deposit dielectric materials and high mobility oxide semiconductors for thin-film transistors. Furthermore, we will show how Spatial ALD can be used for thin-film encapsulation to protect sensitive electronic devices against the ambient. Finally, we will present high selectivity, low defectivity and high throughput area selective Spatial ALD, which will be an important method for next generation device manufacturing. Join the webinar, discover the potential of Spatial ALD for large area electronics and find out what Spatial ALD can do for your applications.
Meet the speaker
Alfredo Mameli received his MSc in Materials Science (cum laude) at University of Bari, Italy in 2013. He accomplished his PhD research in 2018 at TU
Eindhoven, The Netherlands, on selective atomic layer deposition and etching of oxides, in which he established novel methods for achieving area-selective atomic layer deposition and atomic layer etching. In 2018 he was awarded with the atomic layer etching (ALE) Best Student Paper Award at the ALD/ALE 2018 conference. In 2018 he joined the Thin Film Technology group at Holst Centre, powered by TNO, Eindhoven, where he led several business-to-business projects with customers and developed novel spatial ALD processes, including area-selective spatial ALD of laboratory. His current projects and interests are on surface chemistry, deposition and etching for micro- and nanofabrication, thin-film transistors and the development of selective spatial ALD processes.